Point-of-use exhaust by-product reactor
US6368567B2 · kind B2 · utility
11Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 7, 1998 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Oct 7, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4412
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and an apparatus is provided for removing wafer processing by-products from gas fluid exhaust systems utilizing an energy source placed within an exhaust channel either alone or in combination with a cleaning gas. The placement of the energy source in an exhaust channel enables emitted energy to react with wafer processing by-products to convert the by-product residues to more removable forms. Additionally provided is a cleaning gas source internal to the exhaust channel to further react with and convert exiting by-product residues to gaseous fluids.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.