Copolymer resin, preparation thereof, and photoresist using the same
US6369181B1 · kind B1 · utility
10Cited by
27References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 29, 1998 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Dec 29, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a copolymer resin for a photoresist used with far ultraviolet rays such as KrF or ArF. The copolymer is represented by the following formula III:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.