Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby

US6372412B1 · kind B1 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Mark C. Hakey · Saint Albans, US
• Steven J. Holmes · Colchester, US
• David V. Horak · South Burlington, US
• Ahmad D. Katnani · Poughkeepsie, US
• Niranjan M. Patel · Wappingers Falls, US
• Paul A. Rabidoux · Winooski, US

Key dates

• Filing date: Feb 10, 1998
• Grant date: Apr 16, 2002
• Expiry date: Feb 10, 2018

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A photoresist composition is disclosed having both negative tone and positive tone responses, giving rise to spaces being formed in the areas of diffraction which are exposed to intermediate amounts of radiation energy. This resist material may be used to print doughnut shapes or may be subjected to a second masking step, to print lines. Additionally, larger and smaller features may be obtained using a gray-scale filter in the reticle, to create larger areas of intermediate exposure areas.