Angled halo implant tailoring using implant mask
US6372587B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 10, 2000 |
| Grant date | Apr 16, 2002 |
| Priority date | — |
| Expiry date | May 10, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/603
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method is provided for forming a halo implant in a substrate adjacent one side of a structure, the method including forming the structure above a surface of the substrate, the structure having first and second edges and forming a mask defining a region adjacent the structure, the mask having a thickness &tgr; above the surface and having an edge disposed a distance &dgr; from the first edge of the structure. The method also includes implanting the halo implant at an angle &agr; with respect to a direction perpendicular to the surface, wherein the tangent of the angle &agr; is at least the ratio of the distance &dgr; to the thickness &tgr;.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.