Patent · US Expired

Single semiconductor wafer processor

US6374837B2 · kind B2 · utility

10Cited by
7References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 17, 2001
Grant dateApr 23, 2002
Priority date—
Expiry dateMay 17, 2021

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S134/902
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An apparatus for processing or drying a semiconductor wafer includes a rotor for holding a wafer and for spinning the wafer about a first axis. A pivot arm supports the rotor, so that the rotor can pivot about a second axis that is substantially perpendicular to the first axis. A basin holding a processing fluid is located below the rotor, with the rotor vertically movable into and out of the processing fluid via an elevator supporting the pivot arm. The rotor is pivotable into a position where it holds the wafer at an inclined angle so that the wafer may be withdrawn from the processing fluid at said inclined angle to facilitate drying of the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.