Gary L. Curtis
51Patents
16h-index
29Co-inventors
84Inventor score
Filing activity: Nov 5, 1992 → May 6, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6447232B1 | Semiconductor wafer processing apparatus having improved wafer input/output handling system | Emerging Cross-Sectional Technologies | 463 | Expired |
| US5544421A | Semiconductor wafer processing system | Emerging Cross-Sectional Technologies | 72 | Expired |
| US5664337A | Automated semiconductor processing systems | Emerging Cross-Sectional Technologies | 66 | Expired |
| US5660517A | Semiconductor processing system with wafer container docking and loading station | Emerging Cross-Sectional Technologies | 63 | Expired |
| US5678320A | Semiconductor processing systems | Emerging Cross-Sectional Technologies | 59 | Expired |
| US6395101B1 | Single semiconductor wafer processor | Emerging Cross-Sectional Technologies | 36 | Expired |
| US6423642B1 | Reactor for processing a semiconductor wafer | Emerging Cross-Sectional Technologies | 33 | Expired |
| US5784797A | Carrierless centrifugal semiconductor processing system | Electricity | 32 | Expired |
| US6413436B1 | Selective treatment of the surface of a microelectronic workpiece | Emerging Cross-Sectional Technologies | 29 | Expired |
| US6350319B1 | Micro-environment reactor for processing a workpiece | Emerging Cross-Sectional Technologies | 27 | Expired |
| US6264752A | Reactor for processing a microelectronic workpiece | Electricity | 26 | Expired |
| US6632292B1 | Selective treatment of microelectronic workpiece surfaces | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6014817A | Semiconductor wafer processing system | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7399713B2 | Selective treatment of microelectric workpiece surfaces | Emerging Cross-Sectional Technologies | 18 | Expired |
| US5882168A | Semiconductor processing systems | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5836736A | Semiconductor processing system with wafer container docking and loading station | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5784802A | Semiconductor processing systems | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6318385A | Micro-environment chamber and system for rinsing and drying a semiconductor workpiece | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6712577B2 | Automated semiconductor processing system | Emerging Cross-Sectional Technologies | 12 | Expired |
| US5788454A | Semiconductor wafer processing system | Emerging Cross-Sectional Technologies | 11 | Expired |
| US5996241A | Semiconductor wafer processing system with immersion module | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6794291B2 | Reactor for processing a semiconductor wafer | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6374837B2 | Single semiconductor wafer processor | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7429537B2 | Methods and apparatus for rinsing and drying | Electricity | 10 | Expired |
| US6446643B2 | Micro-environment chamber and system for rinsing and drying a semiconductor workpiece | Emerging Cross-Sectional Technologies | 9 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.