Chromeless alternating reticle for producing semiconductor device features
US6376130B1 · kind B1 · utility
11Cited by
14References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 22, 2000 |
| Grant date | Apr 23, 2002 |
| Priority date | — |
| Expiry date | Feb 22, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/34
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alternating phase shift reticle for a capacitor layout scheme for a memory device and a method for its fabrication is disclosed. The alternating phase shift mask has regions of 0 and 180 degree phase shifts arranged in a way such that all sides of each region corresponding to a given phase shift value are bounded by areas corresponding to an opposite phase shift value. The reticle can be used to produce densely packed capacitor features, in which the variance between the actual exposure pattern and the desired exposure pattern is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.