Imaging method using phase boundary masking with modified illumination
US6388736B1 · kind B1 · utility
23Cited by
6References
51Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 15, 2000 |
| Grant date | May 14, 2002 |
| Priority date | — |
| Expiry date | Nov 15, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection lithography system provides a cross-quadrupole illumination pattern in combination with a translucent substrate having boundary relief features. The features are spaced close together so that they are not imaged in a focal plane, but generate a dark image of the space between the features in the focal plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.