Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers
US6389045B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2000 |
| Grant date | May 14, 2002 |
| Priority date | — |
| Expiry date | Apr 17, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S372/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus are provided for temporally stretching and smoothing of the pulses of an output beam of excimer and lithography lasers. The method and apparatus are based upon providing an optical delay line or circuit having a plurality of optical reflectors and a plurality of beam recombiners or splitters so arranged as to divide the pulse into numerous portions which vary in their travel time through the circuit. As a result, the energy of the incident pulse is greatly stretched and smoothed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.