Scanning wheel for ion implantation process chamber
US6392245B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2000 |
| Grant date | May 21, 2002 |
| Priority date | — |
| Expiry date | Mar 3, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/20228
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A scan wheel for an ion implanter adapted for carrying a plurality of semiconductor wafers. The scan wheel being rotatable about an axis comprises a central hub, a plurality of separate spoke arms mounted on and extending from the central hub, and a plurality of wafer support elements on the outer ends of respective spoke arms. Each spoke arm has a dimension in the direction of rotation substantially less than the dimension of the corresponding wafer support element, a front face extending generally in the direction of rotation and side faces extending rearwardly from the front face. Each side face does not extend outwards beyond a rearward projection of the corresponding front face which, in a cross section, tapers symmetrically inwards, preferably by 7°, on each side relative to the axis of rotation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.