Phenylenediamine derivative-type additive useful for a chemically amplified photoresist
US6399272B1 · kind B1 · utility
4Cited by
1References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2000 |
| Grant date | Jun 4, 2002 |
| Priority date | — |
| Expiry date | Jun 15, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a phenylenediamine derivative of the formula: where B and B′ are defined herein. The phenylenediamine derivatives of the present invention are useful as an additive in a photoresist composition. For example, it has been found that photoresist. compositions comprising the phenylenediamine derivative of the present invention have a high energy latitude margin, an improved contrast value, and enhanced post exposure delay stability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.