Integrated processing system having multiple reactors connected to a central chamber

US6413320B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Joseph A. Maher · Wenham, US
• E. John Vowles · Deering, US
• Joseph D. Napoli · Titicus, US
• Arthur W. Zafiropoulo · Atherton, US
• Mark William Miller · Waterloo, US

Key dates

• Filing date: Feb 13, 2001
• Grant date: Jul 2, 2002
• Expiry date: Feb 13, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S414/141
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

An integrated wafer processing system having a wafer queuing station and a plurality of plasma reactors connected to peripheral walls of a central vacuum chamber. Vacuum valves separate the central chamber from the queuing station and the plasma reactors. A wafer transfer arm capable of R-&THgr; motion can transfer wafers between the queuing station and any of the plasma reactors in either a single-step or a multi-step process.