Method and apparatus for enhancing yield of secondary ions
US6414307B1 · kind B1 · utility
65Cited by
12References
21Claims
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Key dates
| Filing date | Jul 9, 1999 |
| Grant date | Jul 2, 2002 |
| Priority date | — |
| Expiry date | Jul 9, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/949
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The sensitivity of a secondary ion mass spectrometer (SIMS) is increased by using water vapor to enhance the yield of positive secondary ions sputtered by a primary focused ion beam. Water vapor is injected through a needle that is positioned close to the sample and electrically biased to reduce interference with secondary ion collection field. The sensitivity is enhanced for metals in particular, which tend to be sputtered as positive ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.