Exposure apparatus, exposure method using the same and method of manufacture of circuit device
US6414743B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 18, 1999 |
| Grant date | Jul 2, 2002 |
| Priority date | — |
| Expiry date | Oct 18, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70941
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure method for irradiating a mask with an illumination light through an illumination optical system and exposing photosensitive substrate to the illumination light through a projection optical system including the steps of supplying gas having less absorption of the illumination light to a light path of the illumination light, at least a portion of the illumination optical system and the projection optical system; and changing an exposing condition for the photosensitive substrate in accordance with a variation in transmittance or in reflectance of at least one of the illumination optical system and the projection optical system, resulting from irradiation of the illumination light and attenuation of the illumination light in the light path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.