Enhanced surface modification of low K carbon-doped oxide
US6417098B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 1999 |
| Grant date | Jul 9, 2002 |
| Priority date | — |
| Expiry date | Dec 9, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76807
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for modifying the hydrophobicity of the surface of a carbon-doped oxide film is disclosed. Carbon-doped oxide films have exhibited a high hydrophobic nature which inhibits effective cleaning of its surface by conventional techniques. The present invention uses a surface treatment comprising a solution of sulfuric acid and hydrogen peroxide in water to alter the hydrophobicity of the carbon-doped oxide. After treatment by the sulfuric acid and hydrogen peroxide solution, the surface of the carbon-doped oxide becomes hydrophilic. Moreover, the modification of the carbon-doped oxide only occurs at the surface. Therefore, the low k dielectric characteristics of the carbon-doped oxide are retained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.