Alignment device and lithographic apparatus comprising such a device
US6417922B1 · kind B1 · utility
34Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 1, 1999 |
| Grant date | Jul 9, 2002 |
| Priority date | — |
| Expiry date | Jun 1, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/681
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment device, for use in a lithographic apparatus, for aligning a first object, provided with a first alignment mark relative to a second object, provided with a second alignment mark, employs as a radiation source a laser which emits an alignment beam having a wavelength which is of the order of 1000 nm and to the order of 1100 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.