Contact hole model-based optical proximity correction method
US6420077B1 · kind B1 · utility
12Cited by
0References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 23, 2001 |
| Grant date | Jul 16, 2002 |
| Priority date | — |
| Expiry date | Jan 23, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70483
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A contact hole model-based optical proximity correction method. The method includes building a contact hole model from the database obtained through a series of test patterns each having a plurality of contact holes of different line widths but identical distance of separation. Line width offsets due to proximity effect are eliminated by referring to the contact hole model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.