Statistical process control system with normalized control charting
US6424876B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 1999 |
| Grant date | Jul 23, 2002 |
| Priority date | — |
| Expiry date | Jul 22, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F17/18
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for monitoring the performance of a manufacturing entity is provided. Metrology data indicating an output parameter of the manufacturing entity is retrieved. The output parameter has an associated target value. The metrology data is normalized based on the target value to generate normalized performance data points. A performance rule violation is determined based on the normalized performance data. A manufacturing system includes a metrology tool, a first database, and a processor. The metrology tool is adapted to measure an output parameter of a manufacturing entity to generate metrology data. The output parameter has an associated target value. The first database is adapted to receive the metrology data. The processor is adapted to retrieve the metrology data from the database, normalize the metrology data based on the target value to generate normalized performance data points, and determine a performance rule violation based on the normalized performance data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.