High-aspect ratio resist development using safe-solvent mixtures of alcohol and water
US6440639B1 · kind B1 · utility
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10Claims
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Key dates
| Filing date | Sep 28, 2000 |
| Grant date | Aug 27, 2002 |
| Priority date | — |
| Expiry date | Nov 3, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high-aspect ratio resist profile is obtained using a development process wherein a mixture of an alcohol and water is used as the developer. The alcohol/water mixture is non-toxic, and does not cause excess swelling and cracking of the resist during the development process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.