Micro-environment chamber and system for rinsing and drying a semiconductor workpiece
US6446643B2 · kind B2 · utility
9Cited by
46References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2001 |
| Grant date | Sep 10, 2002 |
| Priority date | — |
| Expiry date | Jun 12, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In a method for rinsing and drying a semiconductor workpiece in a micro-environment, the workpiece is placed into a rinser/dryer housing. The rinser/dryer housing is rotated by a rotor motor. The rinser/dryer housing defines a substantially closed rinser/dryer chamber. Rinsing and drying fluids are distributed across at least one face of the semiconductor workpiece by the action of centrifugal force generated during rotation of the housing. A fluid supply system is connected to sequentially supply a rinsing fluid followed by a drying fluid to the chamber as the housing is rotated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.