Process chamber having a voltage distribution electrode
US6447637B1 · kind B1 · utility
9Cited by
8References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2000 |
| Grant date | Sep 10, 2002 |
| Priority date | — |
| Expiry date | Sep 30, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention provides a process chamber and voltage distributive electrode (VDE) which distributes capacitive coupling between an inductive source and a plasma in a process chamber. The VDE is preferably slotted defining energy opaque and energy transparent portions which enable inductive coupling into the chamber while distributing capacitive coupling uniformly over the dielectric window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.