Gas driven rotating susceptor for rapid thermal processing (RTP) system

US6449428B2 · kind B2 · utility

Assignee

• Mattson Technology, Inc. · US

Inventors

• Helmut Aschner · Beimerstetten, DE
• Andreas Hauke · Neu-Ulm, DE
• Karsten Weber · Leutenbach, DE
• Dieter Zernickel · Ulm, DE

Key dates

• Filing date: Dec 11, 1998
• Grant date: Sep 10, 2002
• Expiry date: Dec 11, 2018

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C30B31/14
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Air bearings support a rotating wafer carrying base in an RTP system. The base in proximity to the air bearing is protected from warping due to absorption of radiation from the hot wafer being treated. The most preferred embodiment splits the base into an inner disk carrying the wafer and an outer ring, where the inner ring which absorbs the most energy contacts and is supported at three points by the outer disk which is supported by the air bearing.