Decontamination of a plasma reactor using a plasma after a chamber clean
US6449521B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 18, 1998 |
| Grant date | Sep 10, 2002 |
| Priority date | — |
| Expiry date | Sep 18, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for reducing fluorine and other sorbable contaminants in plasma reactor used in chemical vapor deposition process such as the deposition of silicon oxide layer by the reaction of TEOS and oxygen. According to the method of the present invention, plasma of an inert gas is maintained in plasma reactor following chamber clean to remove sorbable contaminants such as fluorine. The plasma clean is typically followed by seasoning of the reactor to block or retard remaining contaminants. According to one embodiment of the invention, the combination of chamber clean, plasma clean, and season film is conducted before PECVD oxide layer is deposited on wafer positioned in the plasma reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.