Radiation source for use in lithographic projection apparatus
US6452194B2 · kind B2 · utility
53Cited by
9References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 14, 2000 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Dec 14, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/007
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.