Plasma focus high energy photon source with blast shield
US6452199B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 18, 1999 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Nov 18, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0094
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.