Igor V. Fomenkov
164Patents
40h-index
182Co-inventors
93Inventor score
Filing activity: Jul 16, 1993 → Oct 16, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6128323A | Reliable modular production quality narrow-band high REP rate excimer laser | Electricity | 171 | Expired |
| US5729562A | Pulse power generating circuit with energy recovery | Electricity | 151 | Expired |
| US6005879A | Pulse energy control for excimer laser | Electricity | 146 | Expired |
| US6567450B2 | Very narrow band, two chamber, high rep rate gas discharge laser system | Electricity | 144 | Expired |
| US5991324A | Reliable. modular, production quality narrow-band KRF excimer laser | Electricity | 139 | Expired |
| US6625191B2 | Very narrow band, two chamber, high rep rate gas discharge laser system | Electricity | 136 | Expired |
| US6192064A | Narrow band laser with fine wavelength control | Electricity | 135 | Expired |
| US6094448A | Grating assembly with bi-directional bandwidth control | Electricity | 112 | Expired |
| US5978391A | Wavelength reference for excimer laser | Electricity | 111 | Expired |
| US5771258A | Aerodynamic chamber design for high pulse repetition rate excimer lasers | Electricity | 110 | Expired |
| US6064072A | Plasma focus high energy photon source | Electricity | 92 | Expired |
| US6078599A | Wavelength shift correction technique for a laser | Electricity | 88 | Expired |
| US6566667B1 | Plasma focus light source with improved pulse power system | Electricity | 88 | Expired |
| US6972421B2 | Extreme ultraviolet light source | Electricity | 86 | Expired |
| US5450207A | Method and apparatus for calibrating a laser wavelength control mechanism | Physics | 84 | Expired |
| US7164144B2 | EUV light source | Physics | 79 | Expired |
| US6671294B2 | Laser spectral engineering for lithographic process | Electricity | 77 | Expired |
| US6452199B1 | Plasma focus high energy photon source with blast shield | Electricity | 76 | Expired |
| US6586757B2 | Plasma focus light source with active and buffer gas control | Electricity | 75 | Expired |
| US7087914B2 | High repetition rate laser produced plasma EUV light source | Electricity | 69 | Expired |
| US6815700B2 | Plasma focus light source with improved pulse power system | Electricity | 69 | Expired |
| US6566668B2 | Plasma focus light source with tandem ellipsoidal mirror units | Electricity | 66 | Expired |
| US7405416B2 | Method and apparatus for EUV plasma source target delivery | Electricity | 64 | Expired |
| US5898725A | Excimer laser with greater spectral bandwidth and beam stability | Electricity | 61 | Expired |
| US7491954B2 | Drive laser delivery systems for EUV light source | Electricity | 60 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.