Apparatus and method for forming a charged particle beam of arbitrary shape
US6455863B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 9, 1999 |
| Grant date | Sep 24, 2002 |
| Priority date | — |
| Expiry date | Jun 9, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam column for generating a variable shaped (in cross section) charged particle beam. The charged particle beam column includes: a source of a charged particle beam; a first aperture defining a first opening positioned coaxial to the beam and spaced apart from the source; a second aperture defining a second opening positioned coaxial to the beam and spaced apart from the first aperture; a third aperture defining a third opening positioned coaxial to the beam and spaced apart from the second aperture; an imaging device coaxial to the beam, where the imaging device controls focusing of the beam; and at least two deflection devices coaxial to the beam which controls a path of the beam through the openings. The charged particle beam column alternatively includes a source of a charged particle beam; a first aperture defining a first opening positioned coaxial to the beam and spaced apart from the source; a second aperture defining a second opening positioned coaxial to the beam and spaced apart from the first aperture; a solenoid lens which controls focusing of the beam; and at least one deflection device coaxial to the beam which controls a path of the beam through …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.