System and method of providing improved CD-SEM pattern recognition of structures with variable contrast
US6462343B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 23, 2001 |
| Grant date | Oct 8, 2002 |
| Priority date | — |
| Expiry date | Jan 23, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system for determining a shape of a feature is provided. The system includes an analysis system providing a signal corresponding to a scan of a portion of a surface of the feature and a stored signal corresponding to a portion of a profile of a similar feature, wherein the profile may have differing contrast levels than scanned portion of the surface of the feature. A processing system is operatively coupled to the analysis system, wherein the processing system is configured to determine the shape of the feature by positioning the signal corresponding to the surface of the feature relative to the stored signal and comparing for regions of substantially constant contrast between the two signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.