Method for managing a fluid level associated with a substrate processing tank
US6464799B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 2000 |
| Grant date | Oct 15, 2002 |
| Priority date | — |
| Expiry date | Sep 5, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
An improved method and apparatus for adjusting chemistry concentrations and temperatures within a substrate processing tank is provided. A first aspect may include checking the fluid level within the tank, and, if the level is higher than a predetermined upper level, bleeding an amount of fluid from the tank; if the level is lower than a predetermined lower level, flowing an amount of fluid to the tank, and if the level is between the predetermined upper and lower levels, bleeding an amount of fluid from the tank and flowing an amount of fluid to the tank. A second aspect may include flowing water into the tank at a flow rate at least equivalent to the flow rate of water required to achieve a chemistry spike of a predetermined concentration and volume prior to beginning the flow of chemicals. A third aspect may include a method and apparatus for heating or cooling chemistry to a predetermined temperature as the chemistry is recirculated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.