Patent · US Expired

Charge neutralization of electron beam systems

US6465795B1 · kind B1 · utility

22Cited by

5References

40Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Juan R. Madonado · Palo Alto, US
Lee H. Veneklasen · Castro Valley, US
Matthias Brunner · Tauberbischofsheim, DE
Ralf Schmid · Karlsruhe, DE

Key dates

Filing date	Mar 28, 2000
Grant date	Oct 15, 2002
Priority date	—
Expiry date	Mar 28, 2020

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/3175
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

In a charged particle or electron beam system, gas, such as argon or helium, is introduced over the surface of a substrate and ionized to neutralize charge accumulating on the surface from interactions caused by the impinging charged particles. The gas can be distributed throughout the gas chamber or confined to an area above the substrate. The radiation beam to ionize the gas can be directed across or towards the surface of the substrate. In the latter case, the gas pressure may be reduced to zero.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.