Transfer apparatus and transfer method
US6466301B1 · kind B1 · utility
7Cited by
6References
41Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2000 |
| Grant date | Oct 15, 2002 |
| Priority date | — |
| Expiry date | Jan 19, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Alignment marks of partial transfer patterns on a transfer mask are measured. On the basis of these measured alignment marks, functions for determining the positions of the alignment marks and the scale magnification in the relative scanning direction are calculated. The start and end positions of transfer of the partial transfer patterns to an object of transfer are calculated, and the scale magnification for moving a mask stage is corrected. The mask stage and a wafer stage are moved to sequentially expose the partial transfer patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.