Coating and developing system
US6467976B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 7, 2001 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | May 7, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67225
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention has a processing zone having a coating unit for forming a coating film on a substrate, a developing unit for performing development of the substrate, a heat treatment unit for performing heat treatment of the substrate, and a first transfer device for transferring the substrate from/to the coating unit, the developing unit and the heat treatment unit, an interface section in which the substrate is transferred at least on a path between the processing zone and an exposure processing unit outside the system for performing exposure processing for the substrate, a casing for housing the processing zone and the interface section, a gas supply device for supplying an inert gas into the interface section, and an exhaust portion through which an atmosphere in the interface section is discharged, and the heat treatment unit, and a second transfer device for transferring the substrate on a path between the heat treatment unit and the exposure processing unit are disposed in the interface section.According to the present invention, impurities at a molecular level, such as oxygen, basic substances, ozone, and organic substances, can be prevented from adhering to a substra…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.