Method for polishing a memory or rigid disk with an oxidized halide-containing polishing system
US6468137B1 · kind B1 · utility
10Cited by
13References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 7, 2000 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | Sep 7, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/1472
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method for planarizing or polishing a substrate, particularly a memory or rigid disk, is provided. The method comprises abrading at least a portion of a surface of a substrate with a polishing system comprising (i) a polishing composition comprising a liquid carrier, at least one oxidized halide, and at least one amino acid, and (ii) a polishing pad and/or an abrasive.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.