Diffraction spectral filter for use in extreme-UV lithography condenser
US6469827B1 · kind B1 · utility
35Cited by
20References
54Claims
0Family size
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Key dates
| Filing date | Aug 4, 2000 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | Aug 4, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.