Supervisory method for determining optimal process targets based on product performance in microelectronic fabrication
US6470230B1 · kind B1 · utility
73Cited by
7References
37Claims
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Key dates
| Filing date | Jan 4, 2000 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | Jan 4, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is provided. for manufacturing, the method including processing a workpiece in a processing step, measuring a parameter characteristic of the processing performed on the workpiece in the processing step, and forming an output signal corresponding to the characteristic parameter measured. The method also includes setting a target value for the processing performed in the processing step based on the output signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.