Antireflection film, optical element with antireflection film, and production method of the antireflection film
US6472087B1 · kind B1 · utility
14Cited by
2References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 1998 |
| Grant date | Oct 29, 2002 |
| Priority date | — |
| Expiry date | Nov 12, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In order to provide an antireflection film of a wide wavelength bandwidth excellent in environment resistance performance in the ultraviolet wavelength region, the antireflection film is constructed in four-layered, or five-layered, or six-layered structure, using Al2O3 for high-index layers and AlF3 or MgF2 for low-index layers. Vacuum evaporation, sputtering, or CVD is used for formation of the antireflection film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.