System and method for removing contaminant particles relative to an ion beam
US6476399B1 · kind B1 · utility
12Cited by
14References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2000 |
| Grant date | Nov 5, 2002 |
| Priority date | — |
| Expiry date | Apr 11, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31705
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for inhibiting the transport of contaminant particles with an ion beam includes a particle charging system for charging particles within a region through which the ion beam travels. An electric field is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel for the ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.