Michael Graf
34Patents
10h-index
50Co-inventors
78Inventor score
Filing activity: Mar 27, 1998 → Oct 28, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6804560B2 | Retina implant | Electricity | 91 | Expired |
| US6101971A | Ion implantation control using charge collection, optical emission spectroscopy and mass analysis | Electricity | 91 | Expired |
| US6298270A | Retina implant | Human Necessities | 49 | Expired |
| US6135128A | Method for in-process cleaning of an ion source | Electricity | 49 | Expired |
| US6847847B2 | Retina implant assembly and methods for manufacturing the same | Human Necessities | 42 | Expired |
| US6347250B1 | Optically controllable microelectrode array for stimulating cells within a tissue | Human Necessities | 27 | Expired |
| US6828572B2 | Ion beam incident angle detector for ion implant systems | Electricity | 16 | Expired |
| US6953942B1 | Ion beam utilization during scanned ion implantation | Electricity | 16 | Expired |
| US6534775B1 | Electrostatic trap for particles entrained in an ion beam | Electricity | 14 | Expired |
| US6476399B1 | System and method for removing contaminant particles relative to an ion beam | Electricity | 12 | Expired |
| US6992310B1 | Scanning systems and methods for providing ions from an ion beam to a workpiece | Electricity | 8 | Expired |
| US6608315B1 | Mechanism for prevention of neutron radiation in ion implanter beamline | Electricity | 7 | Expired |
| US8193513B2 | Hybrid ion source/multimode ion source | Electricity | 6 | Active |
| US7589333B2 | Methods for rapidly switching off an ion beam | Electricity | 5 | Active |
| US8097860B2 | Multiple nozzle gas cluster ion beam processing system and method of operating | Electricity | 5 | Active |
| US7750320B2 | System and method for two-dimensional beam scan across a workpiece of an ion implanter | Electricity | 4 | Active |
| US8089052B2 | Ion source with adjustable aperture | Electricity | 4 | Active |
| US8691700B2 | Gas cluster ion beam etch profile control using beam divergence | Electricity | 4 | Active |
| US8173980B2 | Gas cluster ion beam system with cleaning apparatus | Electricity | 3 | Active |
| US7423277B2 | Ion beam monitoring in an ion implanter using an imaging device | Electricity | 3 | Active |
| US6992308B2 | Modulating ion beam current | Electricity | 3 | Expired |
| US8304033B2 | Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles | Electricity | 2 | Active |
| US7375355B2 | Ribbon beam ion implanter cluster tool | Electricity | 2 | Active |
| US8981322B2 | Multiple nozzle gas cluster ion beam system | Electricity | 2 | Active |
| US9735019B2 | Process gas enhancement for beam treatment of a substrate | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.