Flexibly suspended gas distribution manifold for plasma chamber
US6477980B1 · kind B1 · utility
299Cited by
14References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 20, 2000 |
| Grant date | Nov 12, 2002 |
| Priority date | — |
| Expiry date | Jan 20, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49826
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspension provides thermal isolation between the gas distribution plate and other components of the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.