John M. White
255Patents
49h-index
197Co-inventors
93Inventor score
Filing activity: Jun 7, 1976 → Apr 5, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5558717A | CVD Processing chamber | Emerging Cross-Sectional Technologies | 971 | Expired |
| US5000113A | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | Electricity | 781 | Expired |
| US8083853B2 | Plasma uniformity control by gas diffuser hole design | Emerging Cross-Sectional Technologies | 722 | Expired |
| US8328939B2 | Diffuser plate with slit valve compensation | Electricity | 715 | Active |
| US4854263A | Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films | Chemistry; Metallurgy | 693 | Expired |
| US6825134B2 | Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow | Electricity | 560 | Expired |
| US4872947A | CVD of silicon oxide using TEOS decomposition and in-situ planarization process | Electricity | 431 | Expired |
| US5362526A | Plasma-enhanced CVD process using TEOS for depositing silicon oxide | Electricity | 406 | Expired |
| US4892753A | Process for PECVD of silicon oxide using TEOS decomposition | Electricity | 344 | Expired |
| US5366585A | Method and apparatus for protection of conductive surfaces in a plasma processing reactor | Emerging Cross-Sectional Technologies | 319 | Expired |
| US8174400B2 | Frequency monitoring to detect plasma process abnormality | Electricity | 307 | Active |
| US4842683A | Magnetic field-enhanced plasma etch reactor | Electricity | 303 | Expired |
| US6477980B1 | Flexibly suspended gas distribution manifold for plasma chamber | Emerging Cross-Sectional Technologies | 299 | Expired |
| US6167834A | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | Electricity | 298 | Expired |
| US8074599B2 | Plasma uniformity control by gas diffuser curvature | Electricity | 245 | Active |
| US7785672B2 | Method of controlling the film properties of PECVD-deposited thin films | Electricity | 241 | Active |
| US7017269B2 | Suspended gas distribution plate | Emerging Cross-Sectional Technologies | 238 | Expired |
| US6823589B2 | Flexibly suspended gas distribution manifold for plasma chamber | Emerging Cross-Sectional Technologies | 236 | Expired |
| US7722925B2 | Showerhead mounting to accommodate thermal expansion | Electricity | 227 | Active |
| US6235634A | Modular substrate processing system | Electricity | 215 | Expired |
| US6688375B1 | Vacuum processing system having improved substrate heating and cooling | Chemistry; Metallurgy | 205 | Expired |
| US9397380B2 | Guided wave applicator with non-gaseous dielectric for plasma chamber | Electricity | 191 | Active |
| US5674786A | Method of heating and cooling large area glass substrates | Emerging Cross-Sectional Technologies | 184 | Expired |
| US7358192B2 | Method and apparatus for in-situ film stack processing | Electricity | 172 | Expired |
| US5512320A | Vacuum processing apparatus having improved throughput | Chemistry; Metallurgy | 159 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.