Microelectronic piezoelectric structure and method of forming the same
US6482538B2 · kind B2 · utility
22Cited by
15References
14Claims
0Family size
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Key dates
| Filing date | Jul 25, 2001 |
| Grant date | Nov 19, 2002 |
| Priority date | — |
| Expiry date | Jul 25, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A high quality epitaxial layer of monocrystalline Pb(Mg,Nb)O3—PbTiO3 or Pb(Mg1−xNbx)O3—PbTiO3 can be grown overlying large silicon wafers by first growing an strontium titanate layer on a silicon wafer. The strontium titanate layer is a monocrystalline layer spaced apart from the silicon wafer by an amorphous interface layer of silicon oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.