Control system for a charged particle exposure apparatus
US6483120B1 · kind B1 · utility
25Cited by
7References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2000 |
| Grant date | Nov 19, 2002 |
| Priority date | — |
| Expiry date | Aug 16, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A control system is provided for a charged particle exposure apparatus. A plurality of dot control data are concatenated and compressed to generate compressed concatenated control data. A plurality of compressed concatenated control data are arranged to generate exposure control data. An electron beam exposure apparatus expands the exposure control data to reconstruct the plurality of dot control data, and performs exposure while controlling blankers on the basis of the reconstructed dot control data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.