Exposure apparatus
US6490025B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 16, 1998 |
| Grant date | Dec 3, 2002 |
| Priority date | — |
| Expiry date | Mar 16, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus for projecting an image pattern on a mask onto a photosensitive substrate, including: a body including a projecting optical system through which the image pattern is projected from the mask to the photosensitive substrate; a first stage movable to the body and adapted to mount the mask; a second stage movable to the body and adapted to mount the photosensitive substrate; a measuring device for measuring the position of either one of the mask mounted on the first stage and the photosensitive substrate mounted on the second stage; a vibration sensor for measuring vibration of the body; and a position controller for controlling the position of either one of the mask mounted on the first stage and the photosensitive substrate mounted on the second stage based on a measurement value of the vibration sensor and a measurement value of the measuring device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.