Apparatus for determination of additives in metal plating baths
US6495011B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 28, 2001 |
| Grant date | Dec 17, 2002 |
| Priority date | — |
| Expiry date | Mar 28, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/4161
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and method for the indirect determination of concentrations of additives in metal plating electrolyte solutions, particularly organic additives in Cu-metalization baths for semiconductor manufacturing. The apparatus features a reference electrode housed in an electrically isolated chamber and continuously immersed in the base metal plating solution (without the additive to be measured). An additive concentration determination method comprises electroplating a test electrode at a constant or known current in a mixing chamber wherein the base metal plating solution is mixed with small volumes of the sample and various calibration solutions containing the additive to be measured. Plating potentials between the electrodes are measured and plotted for each of the solution mixtures, and data are extrapolated to determine the concentration of the additive in the sample. A multi-cycle method determines the concentration of both accelerator and suppressor organic additives in Cu plating solution in a single test suite.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.