Integrated circuit inductor
US6495903B2 · kind B2 · utility
14Cited by
8References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2000 |
| Grant date | Dec 17, 2002 |
| Priority date | — |
| Expiry date | Dec 13, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F17/0006
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An inductor has a spiral aluminum track deposited on an oxide layer over a silicon substrate. The substrate is etched away to form a trench, which extends around beneath the track and provides an air gap having a low dielectric constant. The oxide layer has an inner region within the track, an outer region outside the track and a bridging region extending between the other regions. The bridging region is comprised of intact bridges and gaps therebetween, which are open to the trench and through which an etchant has access to the silicon substrate to form the trench by etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.