Developing method and developing apparatus
US6496245B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2001 |
| Grant date | Dec 17, 2002 |
| Priority date | — |
| Expiry date | Apr 23, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.