Method and apparatus for application of proximity correction with unitary segmentation
US6499003B2 · kind B2 · utility
54Cited by
32References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 3, 1998 |
| Grant date | Dec 24, 2002 |
| Priority date | — |
| Expiry date | Mar 3, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70441
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is a method and apparatus for applying proximity correction to a piece of a mask pattern, by segmenting the piece into a plurality of segments, and applying proximity correction to a first segment without taking into consideration the other segments of the piece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.