Apparatus for electrostatically maintaining subtrate flatness
US6500265B1 · kind B1 · utility
7Cited by
26References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2000 |
| Grant date | Dec 31, 2002 |
| Priority date | — |
| Expiry date | Nov 15, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/23
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for holding a substrate on a support layer in a processing chamber. The apparatus is directed to a susceptor system for a processing chamber in which a substrate is electrostatically held essentially flat. The apparatus includes a substrate support and a support layer composed of a dielectric material disposed on the substrate support. At least one lift pin is used for supporting the substrate relative to the support layer. A device is provided for moving each lift pin relative to the support layer. A device is also provided for producing a plasma within the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.