Patent · US Expired

Integrated platen assembly for a chemical mechanical planarization system

US6503131B1 · kind B1 · utility

16Cited by
119References
40Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 16, 2001
Grant dateJan 7, 2003
Priority date
Expiry dateAug 16, 2021

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B21/20
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Generally, a method and apparatus for supporting a web of polishing material. In one embodiment, the apparatus includes a platen and a blocker valve. The platen includes a support surface adapted to support the polishing material and a port fluidly coupled to the support surface. A housing that includes a supply port and an exit port has a venturi body disposed therein. The blocker valve has a first state whereby a flow through the housing and blocker valve causes vacuum to be drawn through the port disposed in the platen by the venturi body. In another embodiment, the flow through the venturi may be reversed by changing the state of the blocker valve to blow air through the port disposed in the platen, thereby placing the polishing material and the support surface of the platen in a spaced-apart relation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.