Photomask blank, photomask and method of manufacture
US6503669B2 · kind B2 · utility
4Cited by
11References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2001 |
| Grant date | Jan 7, 2003 |
| Priority date | — |
| Expiry date | Jun 24, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/155
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A photomask blank has at least one layer of chromium base film on a transparent substrate. The chromium base film of chromium oxycarbide (CrCO) or chromium oxynitride carbide (CrCON) is formed by a reactive sputtering technique using chromium or chromium containing O, N or C as the target and a mixture of carbon dioxide gas and an inert gas as the sputtering gas. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask are of quality featuring high uniformity within the substrate plane and ease of control during manufacture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.